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Chin. Opt. Lett.
 Home  List of Issues    Issue s1 , Vol. 11 , 2013    10.3788/COL201311.S10601


Characterization of multilayers and their interlayers: applicationto Co-based systems
P. Jonnard, Z.-S. Wang, J.-T. Zhu, C. Meny, J.-M. Andre, M.-H. Hu, K. Le Guen
1 [Laboratoire de Chimie Physique-Matiere Rayonnement, UPMC Univ Paris 06], CNRS UMR 7614, 11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France
2 MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, Department of Physics, [Tongji University], Shanghai 200092, China
3 [Institut de Physique et Chimie des Materiaux de Strasbourg], CNRS UMR 7504, 23 rue du Loess, BP 43, F-67034 Strasbourg cedex 2, France

Chin. Opt. Lett., 2013, 11(s1): pp.S10601

DOI:10.3788/COL201311.S10601
Topic:Duv/euv coatings
Keywords(OCIS Code): 230.4170  240.1485  300.6560  340.7480  

Abstract
We use complementary analysis techniques to determine the structure of nanometric periodic multilayers and particularly their interfaces. We focus on Co-based multilayer which can be used as efficient optical component in the extreme ultraviolet (EUV) range. The samples are characterized using reflectivity measurements in order to determine the thickness and roughness of the various layers, X-ray emission and nuclear magnetic resonance (NMR) spectroscopies to identify the chemical state of the atoms present within the stack and know if they interdiffuse. Results are validated through the use of destructive techniques such as transmission electron microscopy or secondary ion mass spectrometry.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

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Received:2012/12/2
Accepted:2013/1/5
Posted online:2013/5/29

Get Citation: P. Jonnard, Z.-S. Wang, J.-T. Zhu, C. Meny, J.-M. Andre, M.-H. Hu, K. Le Guen, "Characterization of multilayers and their interlayers: applicationto Co-based systems," Chin. Opt. Lett. 11(s1), S10601(2013)

Note: Part of this work was performed within the framework of the ANR-NSFC COBMUL project (ANR-10-INTB-902-01 and NSFC11061130549). TEM measurements were performed at LPS, Paris-Sud University, Orsay, France, within the framework of the METSA network. Reflectivity measurements in the EUV range were performed on the BEAR beamline at the Elettra synchrotron, Trieste, Italy. SIMS experiments took place at LPS, Chimie Paris Tech, France.



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