2018-09-21 Welcome guest,  Sign In  |  Sign Up
Chin. Opt. Lett.
 Home  List of Issues    Issue s1 , Vol. 11 , 2013    10.3788/COL201311.S10605


Method to accurate calibrate deposition rates of EUV multilayer coatings
Lichao Zhang1, Jinsong Gao2
1 State Key Lab of Applied Optics, [Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences], Changchun 130033, China
2 Key Lab of Optical System Advanced Manufacturing Technology, [Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences], Changchun 130033, China

Chin. Opt. Lett., 2013, 11(s1): pp.S10605

DOI:10.3788/COL201311.S10605
Topic:Duv/euv coatings
Keywords(OCIS Code): 310.1620  340.7480  

Abstract
Random thickness error is an important factor which effects the calibration accuracies of deposition rates for extreme ultraviolet (EUV) multilayer coatings fabricated by sputter deposition techniques. A least square fitting method is proposed to determine deposition rates and extract random thickness errors accurately. The validity of this method is shown by evaluating two deposition systems with control abilities of ~0.1 nm and better than 0.01 nm respectively.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 View PDF (152 KB)

Share:


Received:2013/1/4
Accepted:2013/2/5
Posted online:2013/6/7

Get Citation: Lichao Zhang, Jinsong Gao, "Method to accurate calibrate deposition rates of EUV multilayer coatings," Chin. Opt. Lett. 11(s1), S10605(2013)

Note: This work was supported by an Internal Fund of the State Key Laboratory and the National Natural Science Foundation of China (No. 60678034).



References

1. D. T. Attowood, Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, Cambridge, 1999).

2. E. Spiller, Soft X-Ray Optics (SPIE Press, Bellingham, 1994).

3. E. Spiller, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, A. M. Khounsary, (ed.) (SPIE Press, San Diego, 2003) p. 89.

4. R. S. Rosen, D. G. Stearns, M. A. Viliardos, M. E. Kassner, S. P. Vernon, and Y. Cheng, Appl. Opt. 32, 6975 (1993).

5. F. Wang, Z. Wang, J. Zhu, Z. Zhang, W. Wu, S. Zhang, and L. Chen, Chin. Opt. Lett. 4, 550 (2006).


Save this article's abstract as
Copyright©2018 Chinese Optics Letters 沪ICP备05015387