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Chin. Opt. Lett.
 Home  List of Issues    Issue s1 , Vol. 11 , 2013    10.3788/COL201311.S10607

Determination of optical constants in DUV/VUV
Chun Guo1;2, Mingdong Kong1, Dawei Lin1, Cunding Liu1, Weidong Gao1, Bincheng Li1
1 [Institute of Optics and Electronics, Chinese Academy of Sciences], Chengdu 610209, China
2 [University of ChineseAcademy of Sciences], Beijing 100039, China

Chin. Opt. Lett., 2013, 11(s1): pp.S10607

Topic:Duv/euv coatings
Keywords(OCIS Code): 310.0310  310.1860  

An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 oC and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1 \times 10-4, respectively.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

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Posted online:2013/6/14

Get Citation: Chun Guo, Mingdong Kong, Dawei Lin, Cunding Liu, Weidong Gao, Bincheng Li, "Determination of optical constants in DUV/VUV," Chin. Opt. Lett. 11(s1), S10607(2013)



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